Metal organic chemical vapor deposition (MOCVD) since the late 1960 s, has made rapid progress and has been widely used in the preparation of III nitride, III - V compounds, telluride, oxide and other important semiconductor materials and their quantum structure, greatly promoted the optoelectronic devices and the development of microelectronic devices and chips and industrialization, has become a semiconductor superlattice, quantum well, quantum wire and quantum dot structure the development and key technologies of materials and devices. The development of MOCVD technology in the future will bring a broader prospect to the development of compound semiconductor science and technology and industry.
As a platform for the research and development of MOCVD technology and compound semiconductor material devices, the "national MOCVD academic conference" has been successfully held for 15 sessions since the first one held in 1989. The scale and influence of the conference have grown, and it has become an academic event widely participated in by the national academia and industry. This meeting in order to "optoelectronic technology, intelligent green manufacturing" as the theme, choose held in tunxi in anhui, and the participating experts and scholars from the mainland and Hong Kong, Macao and Taiwan regions, engineering and technical personnel and entrepreneurs in MOCVD growth mechanism and technology extension, MOCVD equipment (machine/parts/accessories/raw material), the material structure and properties, optoelectronic devices, power electronics, microwave radio frequency devices, LED intelligent lighting and iot, semiconductor laser, pv/visible light detector, optical communication technology in areas such as extensive communication, understand the development, the promotion of mutual cooperation. This conference will surely play a strong role in promoting the academic research, technological progress and the development of China's MOCVD third generation semiconductor industry.