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Photochemical image transfer requires the use of photoresist. Some basic information about photoresist is described below

Photochemical image transfer requires the use of photoresist. Some basic information about photoresist is described below

  • 2020-06-19
  • Views:0

Photochemical image transfer requires the use of photoresist. Some basic information about photoresist is described below

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  • 2020-06-19
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Information

1) Photoresist: A photosensitive material obtained by photochemistry that is resistant to the etching or electroplating of a particular etching solution.
2) Positive photoresist: part of the photoresist is decomposed (or softened) by light irradiation. After exposure and development, the transparent part of the photographic substrate for production can be removed from the plate.
3) Negative photoresist: the part of photoresist is polymerized (or cross-linked) by light irradiation. After exposure and development, the visible part of the photographic substrate for production can be retained on the board.
4) Classification of photoresist:
According to the use of the anti - etching agent and anti - plating agent.
According to the development type, it can be divided into water-soluble inhibitor, water-soluble inhibitor and solvent-based inhibitor.
According to physical state, it is divided into liquid and dry film corrosion inhibitors.
According to the type of photosensitive can be divided into positive and negative corrosion inhibitors.

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